HCVAC Mid Frequency Magnetron Sputtering PVD Vacuum Coating Machine

HCVAC Mid Frequency Magnetron Sputtering PVD Vacuum Coating Machine

Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage, a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target. 

It can be used to coat metal film, titanium nitride, titanium carbide, and zirconium nitride, chromium nitride and titanium, nickel, chromium, copper , and other compounds film, multi-layer super-hard film, nitrogen-doped titanium film and the alloy film, and in a very short time to complete all the machining process, it is a highly efficient multi-functional coating equipment.

This machine is extensively used in the fields of ultra-hard coating for the tools and mould, decorative coating for watch, jewelries, stainless steel tableware, golf head, hotel product, sanitary ware, luminaires, optical frame, hardware, etc .